Pulsed bias effect on roughness of TiO sub(2):Nb films deposited by grid assisted magnetron sputtering

In this work Nb-doped TiO sub(2) (TiO sub(2):Nb) films were deposited by reactive sputtering. The substrate was biased with negative pulses to change the energy of the ions nearby the sample surface during the deposition. As consequence, the film crystalline structure and roughness were changed. It...

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Veröffentlicht in:Applied adhesion science 2015-12, Vol.3 (1), p.1-6
Hauptverfasser: Scholtz, Juliano Sadi, Stryhalski, Joel, Sagas, Julio Cesar, Recco, Abel Andre Candido, Mezaroba, Marcello, Fontana, Luis Cesar
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Sprache:eng
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Zusammenfassung:In this work Nb-doped TiO sub(2) (TiO sub(2):Nb) films were deposited by reactive sputtering. The substrate was biased with negative pulses to change the energy of the ions nearby the sample surface during the deposition. As consequence, the film crystalline structure and roughness were changed. It was verified that higher energy favours the rutile growth with a higher roughness, even under low temperature as 300 degree C, and the material structure can be controlled by setting the duty cycle, voltage and frequency of the switched power supply applied to the substrate.
ISSN:2196-4351
DOI:10.1186/s40563-015-0031-7