Shadow-casted ultrathin surface coatings of titanium and titanium/silicon oxide sol particles via ultrasound-assisted deposition

[Display omitted] •Fast reacting precursor of TiO2 is used for ultrasound assisted deposition.•Silicon wafer as model hard surface is used for substrate.•Shadow of the horn cast as the coating is visualized by XPS mapping.•“Accelerate and smash” mechanism of coating is confirmed by mapping surface a...

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Veröffentlicht in:Ultrasonics sonochemistry 2016-07, Vol.31, p.481-489
Hauptverfasser: Karahan, H. Enis, Birer, Özgür, Karakuş, Kerem, Yıldırım, Cansu
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Sprache:eng
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Zusammenfassung:[Display omitted] •Fast reacting precursor of TiO2 is used for ultrasound assisted deposition.•Silicon wafer as model hard surface is used for substrate.•Shadow of the horn cast as the coating is visualized by XPS mapping.•“Accelerate and smash” mechanism of coating is confirmed by mapping surface analysis. Ultrasound-assisted deposition (USAD) of sol nanoparticles enables the formation of uniform and inherently stable thin films. However, the technique still suffers in coating hard substrates and the use of fast-reacting sol–gel precursors still remains challenging. Here, we report on the deposition of ultrathin titanium and titanium/silicon hybrid oxide coatings using hydroxylated silicon wafers as a model hard substrate. We use acetic acid as the catalyst which also suppresses the reactivity of titanium tetraisopropoxide while increasing the reactivity of tetraethyl orthosilicate through chemical modifications. Taking the advantage of this peculiar behavior, we successfully prepared titanium and titanium/silicon hybrid oxide coatings by USAD. Varying the amount of acetic acid in the reaction media, we managed to modulate thickness and surface roughness of the coatings in nanoscale. Field-emission scanning electron microscopy and atomic force microscopy studies showed the formation of conformal coatings having nanoroughness. Quantitative chemical state maps obtained by x-ray photoelectron spectroscopy (XPS) suggested the formation of ultrathin (
ISSN:1350-4177
1873-2828
DOI:10.1016/j.ultsonch.2016.01.032