Pulsed-Plasma Physical Vapor Deposition Approach Toward the Facile Synthesis of Multilayer and Monolayer Graphene for Anticoagulation Applications

Pulsed-Plasma Physical Vapor Deposition Approach Toward the Facile Synthesis of Multilayer and Monolayer Graphene for Anticoagulation Applications

We demonstrate the growth of multilayer and single-layer graphene on copper foil using bipolar pulsed direct current (DC) magnetron sputtering of a graphite target in pure argon atmosphere. Single-layer graphene (SG) and few-layer graphene (FLG) films are deposited at temperatures ranging from 700 °...

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Veröffentlicht in:ACS applied materials & interfaces 2016-02, Vol.8 (7), p.4878-4886
Hauptverfasser: Vijayaraghavan, Rajani K, Gaman, Cezar, Jose, Bincy, McCoy, Anthony P, Cafolla, Tony, McNally, Patrick J, Daniels, Stephen
Format: Artikel
Sprache:eng
Schlagworte:
Argon - chemistry
Copper - chemistry
Graphite - chemical synthesis
Graphite - chemistry
Microscopy, Atomic Force
Nanostructures - chemistry
Nanostructures - ultrastructure
Nanotechnology - methods
Photoelectron Spectroscopy
Spectrum Analysis, Raman
Surface Properties
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Zusammenfassung:We demonstrate the growth of multilayer and single-layer graphene on copper foil using bipolar pulsed direct current (DC) magnetron sputtering of a graphite target in pure argon atmosphere. Single-layer graphene (SG) and few-layer graphene (FLG) films are deposited at temperatures ranging from 700 °C to 920 °C within
ISSN:1944-8244
1944-8252
DOI:10.1021/acsami.5b10952