Applied Technology in Generation of Image Mask for Integral Stereolithography with Scanning Line Algorithm

To resolve the problem of low scanning conversion efficiency when great data of nested cross-section contours is processed for implement of mask image in integral stereolithography (SL), a novel method for implement of the mask image with improved scanning line algorithm is proposed in this paper. The improved scanning line algorithm processes the scan conversion only in an Edge Table (ET), and the singularity problem also can be solved with the improved algorithm. The novel algorithm can process nested contour loops and generate correct mask image for integral SL system. The new method of implement of the mask image provides a new solution for integral SL system to build objects with high accuracy.