In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

In situ nanolithography is realized based on warm spin‐casting of block copolymer solutions. This advancement is based on Si‐containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase‐separation combined with the thermal assistance provided by slight temperature elevations during the spin‐casting. Sub‐10 nm half‐pitch nanoscale patterns are produced within 30 s without a separate annealing process.