Terahertz lasers based on intracentre transitions of group V donors in uniaxially deformed silicon

This paper presents a brief overview of available experimental data on the characteristics of stimulated terahertz emission from optically excited neutral group V donors (phosphorus, antimony, arsenic and bismuth) in crystalline silicon subjected to uniaxial compressive strain along the [100] axis....

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Quantum electronics (Woodbury, N.Y.) N.Y.), 2015-01, Vol.45 (2), p.113-120
Hauptverfasser: Kovalevsky, K.A., Abrosimov, N.V., Zhukavin, R.Kh, Pavlov, S.G., Hübers, H.-W., Tsyplenkov, V.V., Shastin, V.N.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This paper presents a brief overview of available experimental data on the characteristics of stimulated terahertz emission from optically excited neutral group V donors (phosphorus, antimony, arsenic and bismuth) in crystalline silicon subjected to uniaxial compressive strain along the [100] axis. Strain is shown to have a significant effect on the characteristics in question. Optimal strain depends on the dopant and may reduce the threshold pump intensity and improve lasing efficiency. We discuss possible mechanisms behind this effect and estimate the limiting output emission parameters.
ISSN:1063-7818
1468-4799
DOI:10.1070/QE2015v045n02ABEH015532