Radicals Are Required for Thiol Etching of Gold Particles

Etching of gold with an excess of thiol ligand is used in both synthesis and analysis of gold particles. Mechanistically, the process of etching gold with excess thiol is unclear. Previous studies have obliquely considered the role of oxygen in thiolate etching of gold. Herein, we show that oxygen or a radical initiator is a necessary component for efficient etching of gold by thiolates. Attenuation of the etching process by radical scavengers in the presence of oxygen, and the restoration of activity by radical initiators under inert atmosphere, strongly implicate the oxygen radical. These data led us to propose an atomistic mechanism in which the oxygen radical initiates the etching process. Eine radikal neue Einsicht: Der Mechanismus des abschließenden Schritts bei der Synthese von auf Atomebene definierten Goldclustern war bislang unklar. Ein thiolinduzierter Ätzprozess wird postuliert, der durch das Disauerstoff‐Diradikal ausgelöst wird.