Nanocharacterization of TiN films obtained by Ion Vapor deposition

We evaluate and characterize the surface at the nanoscale level and take into account the temperature variation effect in the process of plasma ion deposition for H13 steel samples coated by Titanium Nitride (TiN). The interferometric microscopy and atomic force microscopy (AFM) were used to measure...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of physics. Conference series 2011-01, Vol.274 (1), p.012070-4
Hauptverfasser: Lara O, L, Jerez A, M, Morantes M, L, Plata, A, Torres, Y, Lasprilla, M, Zhabon, V
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We evaluate and characterize the surface at the nanoscale level and take into account the temperature variation effect in the process of plasma ion deposition for H13 steel samples coated by Titanium Nitride (TiN). The interferometric microscopy and atomic force microscopy (AFM) were used to measure the film to analyze the variation of structural and morphological properties of nanofilms that depend on the temperature of sustrate.
ISSN:1742-6596
1742-6588
1742-6596
DOI:10.1088/1742-6596/274/1/012070