Influence of post-deposition annealing under magnetic field on the structure of phthalocyanine thin films

A comparative analysis of the influence of post deposition annealing process without and under applied magnetic field of 1 T, on structure and morphology of VOPcF 16 films, has been carried out. The phase transition of VOPcF 16 film upon its annealing under applied magnetic film was studied by the m...

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Veröffentlicht in:Journal of materials science. Materials in electronics 2015-07, Vol.26 (7), p.4716-4721
Hauptverfasser: Basova, Tamara V., Jushina, Irina V., Ray, Asim K.
Format: Artikel
Sprache:eng
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Zusammenfassung:A comparative analysis of the influence of post deposition annealing process without and under applied magnetic field of 1 T, on structure and morphology of VOPcF 16 films, has been carried out. The phase transition of VOPcF 16 film upon its annealing under applied magnetic film was studied by the methods of UV–Visible and Raman spectroscopies as well as atomic force microscopy. It was shown that the temperature of the phase transition of VOPcF 16 decreases from 160 to 100 °C, when magnetic field is applied during post deposition annealing. The formation of VOPcF 16 films with elongated crystallites oriented preferably in one direction was observed after their annealing in magnetic field. The current–voltage characteristic measurements demonstrated an increase in the lateral conductivity for the films annealed under applied magnetic field in comparison with the films annealed without magnetic field.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-015-2924-4