68.2: Study of Optimized Design for High Resistance Black Matrix at In-cell Touch Structure

68.2: Study of Optimized Design for High Resistance Black Matrix at In-cell Touch Structure

In‐cell touch structure requires a high resistance BM (black matrix) because of touch performance. The high resistance BM must have at least 1013 Ω cm and there should be little variation by thermal stress. In this study, we analyzed BM electric properties variation by thermal stress in post bake....

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:SID International Symposium Digest of technical papers 2015-06, Vol.46 (1), p.1008-1011
Hauptverfasser: Na, Younsung, Park, Chul Ho, Kang, Dongwoo, Choi, Youngseok, Jeon, Suho
Format: Artikel
Sprache:eng
Schlagworte:
Black Matrix
Carbon
Charge Transfer
Electric properties
Electron
Heat resistance Polymer
High resistance
Resistance
Technical papers
Touch
Touch performance
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:In‐cell touch structure requires a high resistance BM (black matrix) because of touch performance. The high resistance BM must have at least 1013 Ω cm and there should be little variation by thermal stress. In this study, we analyzed BM electric properties variation by thermal stress in post bake.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.10333