Nb thin films fabricated by a magnetic flux distribution variable-type facing target sputtering system

A magnetic field distribution variable-type facing target sputtering system has been newly devised. The magnetic field distribution between facing targets can be easily changed by moving a magnet without breaking the vacuum. By changing the magnetic field distribution between facing targets, Niobium deposition rate has changed about five times with the same sputtering conditions, such as RF applied electric power and Ar pressure.