Detection of overlay error in double patterning gratings using phase-structured illumination

With the help of simulations we study the benefits of using coherent, phase-structured illumination to detect the overlay error in resist gratings fabricated by double patterning. Evaluating the intensity and phase distribution along the focused spot of a high numerical aperture microscope, the capability of detecting magnitude and direction of overlay errors in the range of a few nanometers is investigated for a wide range of gratings. Furthermore, two measurement approaches are presented and tested for their reliability in the presence of white Gaussian noise.