Electron beam position monitor for a dielectric microaccelerator

Electron beam position monitor for a dielectric microaccelerator

We report the fabrication and first demonstration of an electron beam position monitor for a dielectric microaccelerator. This device is fabricated on a fused silica substrate using standard optical lithography techniques and uses the radiated optical wavelength to measure the electron beam position...

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Veröffentlicht in:Optics letters 2014-08, Vol.39 (16), p.4747-4750
Hauptverfasser: Soong, Ken, Peralta, Edgar A, England, R Joel, Wu, Ziran, Colby, Eric R, Makasyuk, Igor, MacArthur, James P, Ceballos, Andrew, Byer, Robert L
Format: Artikel
Sprache:eng
Schlagworte:
Devices
Dielectrics
Electron beam lithography
Electron beams
Monitors
Position measurement
Spots
Wavelengths
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Beschreibung
Zusammenfassung:We report the fabrication and first demonstration of an electron beam position monitor for a dielectric microaccelerator. This device is fabricated on a fused silica substrate using standard optical lithography techniques and uses the radiated optical wavelength to measure the electron beam position with a resolution of 10 μm, or 7% of the electron beam spot size. This device also measures the electron beam spot size in one dimension.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.39.004747