Effect of Sputtering Power on Photocatalytic Activity of Thin TiO sub(2) Films

TiO sub(2) thin films with outstanding photocatalysis can potentially be used for photocatalysis device in the field of environmental protection. TiO sub(2) thin film (99.99%) was fabricated successfully by power metallurgy. The effect of sputtering power on TiO sub(2) thin films by radio frequency magnetron sputtering was investigated. The results show that the higher sputtering power is beneficial for the growth of Rutile structure with superior photocatalysis. With the increasing of sputtering power, the rate of methyl orange degradation increases under UV light irradiation. The degradation rate of TiO sub(2) thin film under sputtering power 75W and 165W is 40% and 80% respectively. This is attributed to the increase of the rutile phase with many defects and dislocation network under higher sputtering power.