Germanium p-i-n avalanche photodetector fabricated by point defect healing process

In this Letter, we report Ge p-i-n avalanche photodetectors (APD) with low dark current (sub 1 μA below V(R)=5  V), low operating voltage (avalanche breakdown voltage=8-13  V), and high multiplication gain (440-680) by exploiting a point defect healing method (between 600°C and 650°C) and optimizing...

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Veröffentlicht in:Optics letters 2014-07, Vol.39 (14), p.4204-4207
Hauptverfasser: Shim, Jaewoo, Kang, Dong-Ho, Yoo, Gwangwe, Hong, Seong-Taek, Jung, Woo-Shik, Kuh, Bong Jin, Lee, Beomsuk, Shin, Dongjae, Ha, Kyoungho, Kim, Gwang Sik, Yu, Hyun-Yong, Baek, Jungwoo, Park, Jin-Hong
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Sprache:eng
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Zusammenfassung:In this Letter, we report Ge p-i-n avalanche photodetectors (APD) with low dark current (sub 1 μA below V(R)=5  V), low operating voltage (avalanche breakdown voltage=8-13  V), and high multiplication gain (440-680) by exploiting a point defect healing method (between 600°C and 650°C) and optimizing the doping concentration of the intrinsic region (p-type ~10¹⁷ cm⁻³). In addition, Raman spectroscopy and electrochemical capacitance voltage analyses were performed to investigate the junction interfaces in more detail. This successful demonstration of Ge p-i-n APD with low dark current, low operating voltage, and high gain is promising for low-power and high-sensitivity Ge PD applications.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.39.004204