Dielectric properties of composition spread SiO2–Al2O3 mixed phase thin films deposited at room temperature by off-axis RF magnetron sputtering

The dielectric properties of composition spread SiO2-Al2O3 thin films, deposited by off-axis radio-frequency magnetron sputtering at room temperature, were investigated to obtain optimised compositions with low dielectric constants and losses. The specific points (compositions) showing superior diel...

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Veröffentlicht in:	Ceramics international 2012-01, Vol.38, p.S79-S79
Hauptverfasser:	Kim, Y H, Shin, D W, Kim, J S, Song, J-H, Yoon, S-J, Park, K B, Choi, J-W
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Dielectric constant Dielectric properties Magnetron sputtering Silicon dioxide Silicon substrates Spreads Thin films
Online-Zugang:	Volltext
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