Copper Resistance in Anabaena variabilis: Effects of Phosphate Nutrition and Polyphosphate Bodies

A copper-resistant Anabaena variabilis strain was obtained after repeated culturing in progressively higher concentrations of${\rm Cu}({\rm NO}_{3})_{2}$. This strain maintained its resistance even after a year of repeated subculturing in copper-free medium. The resistant strain differed from the sensitive parent strain with respect to filament length, cell shape and size, and control of heterocyst formation. The resistant strain was also more resistant to cadmium, zinc, and nickel. Copper distribution studies conducted with atomic absorption spectroscopy revealed that at low copper levels the sensitive strain bound significantly more metal than the resistant strain. At higher copper levels, however, the resistant strain bound large amounts of the metal. Phosphate-loaded resistant cells could grow in higher copper concentrations than phosphate-starved resistant cells. Toluidine blue staining showed that the resistant strain contained more polyphosphate bodies than the sensitive strain; the resistant cells also had higher internal phosphate levels. X-ray microanalysis, however, did not show a direct localization of copper on polyphosphate bodies. More than one mechanism of resistance may exist in this A. variabilis strain.