The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum
The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly st...
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Veröffentlicht in: | Surface & coatings technology 1992-04, Vol.51 (1), p.30-34 |
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creator | Natishan, P.M. McCafferty, E. Donovan, E.P. Brown, D.W. Hubler, G.K. |
description | The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly stoichiometric Si
3N
4. X-ray photoelectron spectroscopy showed that the surface of the IBAD samples is composed of Si
3N
4, SiO
2, and a silicon oxynitride species. Pit propagation beneath the coatings proceeds by blister formation and rupture. |
doi_str_mv | 10.1016/0257-8972(92)90210-2 |
format | Article |
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3N
4. X-ray photoelectron spectroscopy showed that the surface of the IBAD samples is composed of Si
3N
4, SiO
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3N
4. X-ray photoelectron spectroscopy showed that the surface of the IBAD samples is composed of Si
3N
4, SiO
2, and a silicon oxynitride species. Pit propagation beneath the coatings proceeds by blister formation and rupture.</description><subject>Applied sciences</subject><subject>Corrosion</subject><subject>Corrosion mechanisms</subject><subject>Exact sciences and technology</subject><subject>Metals. Metallurgy</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNp9kEFr3DAQhUVpodu0_6AHHXpID041siVbl0IJbVII9JJCbkIrjZoptrXVeAP597XZkGNgYObwvXkzT4iPoC5Agf2itOmbwfX63OnPTmlQjX4ldjD0rmnbrn8tds_IW_GO-a9SCnrX7cTd7T3KAy0LzX_kHu_DA5UqS5ZMI8Uyy5mWSgklrfMewyQDM_GCSSY8FKZtiiVsepYrE8bjRPNxei_e5DAyfnjqZ-L3j--3l9fNza-rn5ffbprYWrs0YIMzkEHvQZvsnIOUzF6h6dDm7eigYgipj7lrwabQ5b61g8EE2OfkTHsmzk97D7X8OyIvfiKOOI5hxnJkD3YYjAbd6RXtTmishbli9odKU6iPHpTfgvSbod9S8m6tLUi_yT49OQSOYcw1zJH4WWu0XT-BFft6wnD99oGweo6Ec8REFePiU6GXff4DwxqHdg</recordid><startdate>19920415</startdate><enddate>19920415</enddate><creator>Natishan, P.M.</creator><creator>McCafferty, E.</creator><creator>Donovan, E.P.</creator><creator>Brown, D.W.</creator><creator>Hubler, G.K.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SE</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19920415</creationdate><title>The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum</title><author>Natishan, P.M. ; McCafferty, E. ; Donovan, E.P. ; Brown, D.W. ; Hubler, G.K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c366t-16a951f12b125f9991dd5b0e54e6f0257a0caad7cf4316da4f73685ed1e7fd953</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1992</creationdate><topic>Applied sciences</topic><topic>Corrosion</topic><topic>Corrosion mechanisms</topic><topic>Exact sciences and technology</topic><topic>Metals. Metallurgy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Natishan, P.M.</creatorcontrib><creatorcontrib>McCafferty, E.</creatorcontrib><creatorcontrib>Donovan, E.P.</creatorcontrib><creatorcontrib>Brown, D.W.</creatorcontrib><creatorcontrib>Hubler, G.K.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Corrosion Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Natishan, P.M.</au><au>McCafferty, E.</au><au>Donovan, E.P.</au><au>Brown, D.W.</au><au>Hubler, G.K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum</atitle><jtitle>Surface & coatings technology</jtitle><date>1992-04-15</date><risdate>1992</risdate><volume>51</volume><issue>1</issue><spage>30</spage><epage>34</epage><pages>30-34</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly stoichiometric Si
3N
4. X-ray photoelectron spectroscopy showed that the surface of the IBAD samples is composed of Si
3N
4, SiO
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subjects | Applied sciences Corrosion Corrosion mechanisms Exact sciences and technology Metals. Metallurgy |
title | The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum |
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