The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum

The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly st...

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Veröffentlicht in:Surface & coatings technology 1992-04, Vol.51 (1), p.30-34
Hauptverfasser: Natishan, P.M., McCafferty, E., Donovan, E.P., Brown, D.W., Hubler, G.K.
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container_end_page 34
container_issue 1
container_start_page 30
container_title Surface & coatings technology
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creator Natishan, P.M.
McCafferty, E.
Donovan, E.P.
Brown, D.W.
Hubler, G.K.
description The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly stoichiometric Si 3N 4. X-ray photoelectron spectroscopy showed that the surface of the IBAD samples is composed of Si 3N 4, SiO 2, and a silicon oxynitride species. Pit propagation beneath the coatings proceeds by blister formation and rupture.
doi_str_mv 10.1016/0257-8972(92)90210-2
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subjects Applied sciences
Corrosion
Corrosion mechanisms
Exact sciences and technology
Metals. Metallurgy
title The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum
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