The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum

The pitting behavior of silicon nitride ion beam assisted deposited coatings on aluminum

The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly st...

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Veröffentlicht in:Surface & coatings technology 1992-04, Vol.51 (1), p.30-34
Hauptverfasser: Natishan, P.M., McCafferty, E., Donovan, E.P., Brown, D.W., Hubler, G.K.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Corrosion
Corrosion mechanisms
Exact sciences and technology
Metals. Metallurgy
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Zusammenfassung:The pitting potential of silicon nitride ion beam assisted deposited (IBAD) coatings on aluminum in deaerated 0.1 M NaCl solutions increased with coating thickness for coatings ranging from 0.01 to 2.0 μm. Rutherford backscattering spectroscopy and optical techniques showed the films to be nearly stoichiometric Si 3N 4. X-ray photoelectron spectroscopy showed that the surface of the IBAD samples is composed of Si 3N 4, SiO 2, and a silicon oxynitride species. Pit propagation beneath the coatings proceeds by blister formation and rupture.
ISSN:0257-8972
1879-3347
DOI:10.1016/0257-8972(92)90210-2