Novel chlorine resistant low-fouling ultrafiltration membrane based on a hydrophilic polyaniline derivative

We demonstrate that poly( n -2-hydroxyethyl aniline) ( n -PANi), a derivative of polyaniline (PANi), provides an effective chlorine tolerant PANi-based ultrafiltration (UF) membrane. n -PANi was synthesized from its monomer via chemical oxidative polymerization. Unlike PANi, n -PANi can be dissolved...

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Veröffentlicht in:Journal of materials chemistry. A, Materials for energy and sustainability Materials for energy and sustainability, 2015-01, Vol.3 (16), p.8725-8733
Hauptverfasser: Huang, Xinwei, McVerry, Brian T, Marambio-Jones, Catalina, Wong, Mavis C. Y, Hoek, Eric M. V, Kaner, Richard B
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Sprache:eng
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Zusammenfassung:We demonstrate that poly( n -2-hydroxyethyl aniline) ( n -PANi), a derivative of polyaniline (PANi), provides an effective chlorine tolerant PANi-based ultrafiltration (UF) membrane. n -PANi was synthesized from its monomer via chemical oxidative polymerization. Unlike PANi, n -PANi can be dissolved in N -methyl-2-pyrollidone (NMP) up to 30 wt% to form a casting solution which is stable for months without the aid of an anti-gelling agent. Membranes formed from n -PANi show high resistance to chlorine, even when exposed to 250 ppm sodium hypochlorite for 30 days while PANi membranes completely lose their ability to reject bovine serum albumin (BSA, 6 nm) after 2 days. Spectroscopic studies indicate that the benzenoid groups in PANi membranes are oxidized while n -PANi membranes maintain their chemical structure. n -PANi membranes display high hydrophilicity with a contact angle of ∼36 degrees which contributes to their ultra-low adhesion of E. coli . Cross-flow fouling tests with 1.5 g L −1 BSA fouling solution reveal that n -PANi membranes exhibit low-fouling properties with only 11% flux decline and 91% flux recovery, superior to PANi and commercial polysulfone (PSf) membranes. n -PANi, an outstanding candidate for making chlorine tolerant antifouling ultrafiltration membranes.
ISSN:2050-7488
2050-7496
DOI:10.1039/c5ta00900f