Electrical characteristics and short-channel effect of c-axis aligned crystal indium gallium zinc oxide transistor with short channel length
A channel length of a c-axis aligned crystal indium gallium zinc oxide (CAAC-IGZO) transistor having low off-state current at a yA/µm level was decreased to 100 nm, and the electrical characteristics and short-channel effect of the CAAC-IGZO transistor were researched. As a result, we found that, in...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2014-04, Vol.53 (4S), p.4-1-04EF03-5 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A channel length of a c-axis aligned crystal indium gallium zinc oxide (CAAC-IGZO) transistor having low off-state current at a yA/µm level was decreased to 100 nm, and the electrical characteristics and short-channel effect of the CAAC-IGZO transistor were researched. As a result, we found that, in the CAAC-IGZO transistor with L = 100 nm, even with a gate insulator film having an equivalent oxide thickness (EOT) = 11 nm, an extremely small off-state current of 380 yA/µm at 85 °C is maintained, in addition channel length dependence of the electrical characteristics is hardly seen. Favorable values of characteristics of the CAAC-IGZO transistor can be obtained, such as subthreshold slope (SS) = 77 mV/dec, drain induced barrier lowering (DIBL) = 73 mV/V, threshold voltage (Vth) = 0.65 V, and on-state current (Ion) = 65 µA/µm. These results suggest the possibility that the CAAC-IGZO transistor can be applied to an LSI in a deep submicron region. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.53.04EF03 |