Self-Separation of Sublimation-Grown AlN with AlSiN Buffer Layer
AlN was grown by a sublimation method on 6H-SiC. We found the grown AlN layer is easily separated from the substrate when Si powder is added to the AlN source powder. The formation of AlSiN layer with the Si content of 15% at the AlN/6H-SiC interface was confirmed by energy-dispersive X-ray spectros...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2013-08, Vol.52 (8), p.08JA07-08JA07-2 |
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container_issue | 8 |
container_start_page | 08JA07 |
container_title | Japanese Journal of Applied Physics |
container_volume | 52 |
creator | Nishino, Katsushi Nakauchi, Jun Hayashi, Kotaro Tsukihara, Masashi |
description | AlN was grown by a sublimation method on 6H-SiC. We found the grown AlN layer is easily separated from the substrate when Si powder is added to the AlN source powder. The formation of AlSiN layer with the Si content of 15% at the AlN/6H-SiC interface was confirmed by energy-dispersive X-ray spectroscopy (EDS) and X-ray diffraction (XRD). This AlSiN layer causes the separation of AlN. |
doi_str_mv | 10.7567/JJAP.52.08JA07 |
format | Article |
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We found the grown AlN layer is easily separated from the substrate when Si powder is added to the AlN source powder. The formation of AlSiN layer with the Si content of 15% at the AlN/6H-SiC interface was confirmed by energy-dispersive X-ray spectroscopy (EDS) and X-ray diffraction (XRD). This AlSiN layer causes the separation of AlN.</description><subject>Aluminum nitride</subject><subject>Diffraction</subject><subject>Formations</subject><subject>Silicon</subject><subject>Silicon substrates</subject><subject>Spectroscopy</subject><subject>Sublimation</subject><subject>X-ray diffraction</subject><subject>X-rays</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqFkM9LwzAYhoMoOKdXzz2K0Jqk-XmzDp2OMYXuHpI0wUq31qRl7L-3s949fd8Lz_vB9wBwi2DGKeMPq1XxkVGcQbEqID8DM5QTnhLI6DmYQYhRSiTGl-Aqxq8xMkrQDDyWrvFp6ToddF-3-6T1STmYpt79xnQZ2sM-KZpNcqj7z3Ep603yNHjvQrLWRxeuwYXXTXQ3f3MOti_P28Vrun5fvi2KdWoxw30qLKuoJ1YYaDjMOXTUyEpKkRupDbeyIgR7S4T02hvhYMWEQ9oKJqnQLp-Du-lsF9rvwcVe7epoXdPovWuHqBATlAtEEB7RbEJtaGMMzqsujO-Eo0JQnUypkylFsZpMjYX7qVB3uvsP_gEBvWhm</recordid><startdate>20130801</startdate><enddate>20130801</enddate><creator>Nishino, Katsushi</creator><creator>Nakauchi, Jun</creator><creator>Hayashi, Kotaro</creator><creator>Tsukihara, Masashi</creator><general>The Japan Society of Applied Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130801</creationdate><title>Self-Separation of Sublimation-Grown AlN with AlSiN Buffer Layer</title><author>Nishino, Katsushi ; Nakauchi, Jun ; Hayashi, Kotaro ; Tsukihara, Masashi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c262t-8c6d5f4c8b0b70370e5b9d9983b9ab7c9d442fc489fafb8e0d68e1ac86958ae3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Aluminum nitride</topic><topic>Diffraction</topic><topic>Formations</topic><topic>Silicon</topic><topic>Silicon substrates</topic><topic>Spectroscopy</topic><topic>Sublimation</topic><topic>X-ray diffraction</topic><topic>X-rays</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Nishino, Katsushi</creatorcontrib><creatorcontrib>Nakauchi, Jun</creatorcontrib><creatorcontrib>Hayashi, Kotaro</creatorcontrib><creatorcontrib>Tsukihara, Masashi</creatorcontrib><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Nishino, Katsushi</au><au>Nakauchi, Jun</au><au>Hayashi, Kotaro</au><au>Tsukihara, Masashi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Self-Separation of Sublimation-Grown AlN with AlSiN Buffer Layer</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2013-08-01</date><risdate>2013</risdate><volume>52</volume><issue>8</issue><spage>08JA07</spage><epage>08JA07-2</epage><pages>08JA07-08JA07-2</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>AlN was grown by a sublimation method on 6H-SiC. We found the grown AlN layer is easily separated from the substrate when Si powder is added to the AlN source powder. The formation of AlSiN layer with the Si content of 15% at the AlN/6H-SiC interface was confirmed by energy-dispersive X-ray spectroscopy (EDS) and X-ray diffraction (XRD). This AlSiN layer causes the separation of AlN.</abstract><pub>The Japan Society of Applied Physics</pub><doi>10.7567/JJAP.52.08JA07</doi></addata></record> |
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source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
subjects | Aluminum nitride Diffraction Formations Silicon Silicon substrates Spectroscopy Sublimation X-ray diffraction X-rays |
title | Self-Separation of Sublimation-Grown AlN with AlSiN Buffer Layer |
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