Etching of pentacene film using atomic hydrogen generated on heated tungsten

An etching method for organic semiconductor materials called atomic hydrogen treatment was investigated. In this method, the high-density atomic hydrogen is generated on a heated tungsten surface by a catalytic cracking reaction. Also pentacene films are etched at 0.07 nm/s in tungsten temperature o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Japanese Journal of Applied Physics 2014-05, Vol.53 (5), p.58002-1-058002-3
Hauptverfasser:	Heya, Akira, Matsuo, Naoto
Format:	Artikel
Sprache:	eng
Schlagworte:	Damage Etching High density Organic semiconductors Patterning Pentacene Sample holders Semiconductor devices Tungsten
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!