Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering
The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as we...
Gespeichert in:
| Veröffentlicht in: | Plasma science & technology 2013-12, Vol.15 (12), p.1197-1202, Article 1197 |
|---|---|
| 1. Verfasser: | |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 1202 |
|---|---|
| container_issue | 12 |
| container_start_page | 1197 |
| container_title | Plasma science & technology |
| container_volume | 15 |
| creator | 黄福培 杨麒正 叶超 葛水兵 宁兆元 |
| description | The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron en- ergy distributions （EEDFs） were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian dis- tribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field. |
| doi_str_mv | 10.1088/1009-0630/15/12/07 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1685760951</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><cqvip_id>48179677</cqvip_id><sourcerecordid>1685760951</sourcerecordid><originalsourceid>FETCH-LOGICAL-c306t-1b936b8b19c8dd0dd14fecc15be2063132c1bf76fc7053d41c8e0fcf3d8b605d3</originalsourceid><addsrcrecordid>eNp9kLtOxDAQRVOAxPMHqExHEzITrx2nRMtTArESUFuOY0OQ115srxB8PV6BKCioZjS6d-bOqaojhFMEIRoE6GvgFBpkDbYNdFvV7u9wp9pL6RWAzXpBdyt3Ya3RmQRLbnw20StHzkrjvSLzMDmyCO8mkuBJfjFk4VRaKrJQUS1NUScyeYL0lHFyd_3ZcNgUcr5Wrr6M5m1tvP4gD6t1LtrJPx9U21a5ZA5_6n71dHnxOL-ub--vbuZnt7WmwHONQ0_5IAbstRhHGEeclYwa2WDa8gLSVuNgO251B4yOM9TCgNWWjmLgwEa6X518713FUEKkLJdT0sY55U1YJ4lcsI5Dz7BI22-pjiGlaKxcxWmp4odEkBucckNObshJZBJbCV0xiT8mPWWVp-BzVJP733r8Y30J_vmtQPk9OBPY9bzr6Bf76oX8</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1685760951</pqid></control><display><type>article</type><title>Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering</title><source>IOP Publishing Journals</source><creator>黄福培 杨麒正 叶超 葛水兵 宁兆元</creator><creatorcontrib>黄福培 杨麒正 叶超 葛水兵 宁兆元</creatorcontrib><description>The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron en- ergy distributions （EEDFs） were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian dis- tribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.</description><identifier>ISSN: 1009-0630</identifier><identifier>DOI: 10.1088/1009-0630/15/12/07</identifier><language>eng</language><subject>Antennas ; Discharge ; Electric power generation ; Electron density ; Evolution ; Inductively coupled plasma ; Ion flux ; Plasma potentials ; Sputtering ; 内置天线 ; 功率 ; 双频 ; 溅射 ; 等离子体参数 ; 等离子体特性 ; 线圈 ; 麦克斯韦分布</subject><ispartof>Plasma science & technology, 2013-12, Vol.15 (12), p.1197-1202, Article 1197</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c306t-1b936b8b19c8dd0dd14fecc15be2063132c1bf76fc7053d41c8e0fcf3d8b605d3</citedby><cites>FETCH-LOGICAL-c306t-1b936b8b19c8dd0dd14fecc15be2063132c1bf76fc7053d41c8e0fcf3d8b605d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttp://image.cqvip.com/vip1000/qk/84262X/84262X.jpg</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>黄福培 杨麒正 叶超 葛水兵 宁兆元</creatorcontrib><title>Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering</title><title>Plasma science & technology</title><addtitle>Plasma Science ＆ Technology</addtitle><description>The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron en- ergy distributions （EEDFs） were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian dis- tribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.</description><subject>Antennas</subject><subject>Discharge</subject><subject>Electric power generation</subject><subject>Electron density</subject><subject>Evolution</subject><subject>Inductively coupled plasma</subject><subject>Ion flux</subject><subject>Plasma potentials</subject><subject>Sputtering</subject><subject>内置天线</subject><subject>功率</subject><subject>双频</subject><subject>溅射</subject><subject>等离子体参数</subject><subject>等离子体特性</subject><subject>线圈</subject><subject>麦克斯韦分布</subject><issn>1009-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNp9kLtOxDAQRVOAxPMHqExHEzITrx2nRMtTArESUFuOY0OQ115srxB8PV6BKCioZjS6d-bOqaojhFMEIRoE6GvgFBpkDbYNdFvV7u9wp9pL6RWAzXpBdyt3Ya3RmQRLbnw20StHzkrjvSLzMDmyCO8mkuBJfjFk4VRaKrJQUS1NUScyeYL0lHFyd_3ZcNgUcr5Wrr6M5m1tvP4gD6t1LtrJPx9U21a5ZA5_6n71dHnxOL-ub--vbuZnt7WmwHONQ0_5IAbstRhHGEeclYwa2WDa8gLSVuNgO251B4yOM9TCgNWWjmLgwEa6X518713FUEKkLJdT0sY55U1YJ4lcsI5Dz7BI22-pjiGlaKxcxWmp4odEkBucckNObshJZBJbCV0xiT8mPWWVp-BzVJP733r8Y30J_vmtQPk9OBPY9bzr6Bf76oX8</recordid><startdate>20131201</startdate><enddate>20131201</enddate><creator>黄福培 杨麒正 叶超 葛水兵 宁兆元</creator><scope>2RA</scope><scope>92L</scope><scope>CQIGP</scope><scope>W92</scope><scope>~WA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20131201</creationdate><title>Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering</title><author>黄福培 杨麒正 叶超 葛水兵 宁兆元</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c306t-1b936b8b19c8dd0dd14fecc15be2063132c1bf76fc7053d41c8e0fcf3d8b605d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Antennas</topic><topic>Discharge</topic><topic>Electric power generation</topic><topic>Electron density</topic><topic>Evolution</topic><topic>Inductively coupled plasma</topic><topic>Ion flux</topic><topic>Plasma potentials</topic><topic>Sputtering</topic><topic>内置天线</topic><topic>功率</topic><topic>双频</topic><topic>溅射</topic><topic>等离子体参数</topic><topic>等离子体特性</topic><topic>线圈</topic><topic>麦克斯韦分布</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>黄福培 杨麒正 叶超 葛水兵 宁兆元</creatorcontrib><collection>中文科技期刊数据库</collection><collection>中文科技期刊数据库-CALIS站点</collection><collection>中文科技期刊数据库-7.0平台</collection><collection>中文科技期刊数据库-工程技术</collection><collection>中文科技期刊数据库- 镜像站点</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Plasma science & technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>黄福培 杨麒正 叶超 葛水兵 宁兆元</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering</atitle><jtitle>Plasma science & technology</jtitle><addtitle>Plasma Science ＆ Technology</addtitle><date>2013-12-01</date><risdate>2013</risdate><volume>15</volume><issue>12</issue><spage>1197</spage><epage>1202</epage><pages>1197-1202</pages><artnum>1197</artnum><issn>1009-0630</issn><abstract>The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron en- ergy distributions （EEDFs） were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian dis- tribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.</abstract><doi>10.1088/1009-0630/15/12/07</doi><tpages>6</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1009-0630 |
| ispartof | Plasma science & technology, 2013-12, Vol.15 (12), p.1197-1202, Article 1197 |
| issn | 1009-0630 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_1685760951 |
| source | IOP Publishing Journals |
| subjects | Antennas Discharge Electric power generation Electron density Evolution Inductively coupled plasma Ion flux Plasma potentials Sputtering 内置天线 功率 双频 溅射 等离子体参数 等离子体特性 线圈 麦克斯韦分布 |
| title | Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T18%3A09%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20Internal%20Antenna%20Coil%20Power%20on%20the%20Plasma%20Parameters%20in%2013.56%20MHz/60%20MHz%20Dual-Frequency%20Sputtering&rft.jtitle=Plasma%20science%20&%20technology&rft.au=%E9%BB%84%E7%A6%8F%E5%9F%B9%20%E6%9D%A8%E9%BA%92%E6%AD%A3%20%E5%8F%B6%E8%B6%85%20%E8%91%9B%E6%B0%B4%E5%85%B5%20%E5%AE%81%E5%85%86%E5%85%83&rft.date=2013-12-01&rft.volume=15&rft.issue=12&rft.spage=1197&rft.epage=1202&rft.pages=1197-1202&rft.artnum=1197&rft.issn=1009-0630&rft_id=info:doi/10.1088/1009-0630/15/12/07&rft_dat=%3Cproquest_cross%3E1685760951%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1685760951&rft_id=info:pmid/&rft_cqvip_id=48179677&rfr_iscdi=true |