Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering

The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement. For the pure sputtering discharge, the low electron density and ion flux, the rise of floating potential and plasma potential with increasing power, as well as the bi-Maxwellian distribution of electron en- ergy distributions （EEDFs） were obtained. The assistance of ICP discharge led to the effective increases of electron density and ion flux, the suppression of rise of floating potential and plasma potential, as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian dis- tribution. The increase of electron density and ion flux, and the EEDFs evolution were related to the effective electron heating by the induced electric field.