Fabrication of Self-Supported Al/Polyimide/Al Film with Thick Supporting Nickel Mesh

Fabrication of Self-Supported Al/Polyimide/Al Film with Thick Supporting Nickel Mesh

We present the fabrication of submicron polyimide film sandwiched by Al film. The preparation in two-step method and spin-coating parameters of submicron polyimide film are described. To achieve self-supported structure, thick nickel mesh (ca. 200 μm) was introduced by micro-electroforming. Using ne...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied Mechanics and Materials 2013-02, Vol.290 (Spacecraft Structures, Materials and Mechanical Testing), p.21-24
Hauptverfasser: Yin, Guo He, Sun, Qing Rong, Wang, Yu Sa, Yang, Yan Ji, Cui, Wei Wei, Huo, Jia, Zhang, Zi Liang, Li, Cheng Kui, Lu, Bo, Zhu, Yue, Li, Wei, Wang, Juan, Chen, Yong, Li, Mao Shun, Zhang, Yi, Liu, Xiao Yan, Liu, Yan, Chen, Tian Xiang, Han, Da Wei, Wu, Di, Hu, Wei
Format: Artikel
Sprache:eng
Schlagworte:
Accuracy
Aluminum
Nickel
Optical microscopy
Photoresists
Polyimide resins
Thick films
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We present the fabrication of submicron polyimide film sandwiched by Al film. The preparation in two-step method and spin-coating parameters of submicron polyimide film are described. To achieve self-supported structure, thick nickel mesh (ca. 200 μm) was introduced by micro-electroforming. Using negative tone photoresist SU-8 2150, the nickel grid width was demonstrated in good agreement with its original design value with optical microscopy.
ISSN:1660-9336
1662-7482
1662-7482
DOI:10.4028/www.scientific.net/AMM.290.21