Effect of Nitridation on Indium-Composition of InGaN Films

The Present Study Aims to Understand the Relation between the Nitridation and Indium-Composition of Ingan Grown on Sapphire Substrate Using the Metalorganic Vapor Phase Epitaxy through X-Ray Diffraction Reciprocal Space Mapping Measurements. In-Composition of InGaN on Nitrided Sapphire Substrate Inc...

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Veröffentlicht in:Key engineering materials 2012-01, Vol.508, p.193-198
Hauptverfasser: Kanako, Shojiki, Matsuoka, Takashi, Ji, Shi Yang, Kumar, P.Suresh, Katayama, Ryuji, Hanada, Takashi, Choi, Jung Hun
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container_end_page 198
container_issue
container_start_page 193
container_title Key engineering materials
container_volume 508
creator Kanako, Shojiki
Matsuoka, Takashi
Ji, Shi Yang
Kumar, P.Suresh
Katayama, Ryuji
Hanada, Takashi
Choi, Jung Hun
description The Present Study Aims to Understand the Relation between the Nitridation and Indium-Composition of Ingan Grown on Sapphire Substrate Using the Metalorganic Vapor Phase Epitaxy through X-Ray Diffraction Reciprocal Space Mapping Measurements. In-Composition of InGaN on Nitrided Sapphire Substrate Increased to 13% which Is Higher than the Sample without Nitridation with 7%. Also, Flat Surface Was Observed in the Nitrided Sample. Two Times Larger in-Plane Strain Was Induced at the Nitired Sample. Ingan Grown on Low-Temperature Gan Buffer, however, Did Not Show Clear Effect of Nitridation. The Two Investigated Samples Showed Similar Indium Composition, Surface Flatness, and in-Plane Strain with and without Nitridation. Differences of Indium Incorporation and Relaxation of in-Plane Strain Were Attributed to the Effect of AIN Formed by Nitridation Process.
doi_str_mv 10.4028/www.scientific.net/KEM.508.193
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source Scientific.net Journals
subjects Diffraction
Gallium nitrides
Indium
Indium gallium nitrides
Reciprocal space
Sapphire
Strain
X-rays
title Effect of Nitridation on Indium-Composition of InGaN Films
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