Structural, magnetic and nanomechanical properties in Ni-doped AlN films

•AlN films doped with 2.1–8.2at.% Ni were deposited by magnetron sputtering.•The structural, magnetic and nanomechanical properties of Ni-doped AlN films were characterize in detail.•The magnetic and nanomechanical properties of Al1−xNixN films are strongly dependent on the Ni concentration.•The maximum RT Ms and Hc obtained in Ni-doped AlN film were about 4.56emu/cm3 and 111Oe, respectively.•Al1−xNixN films for x=0.021 exhibited favorable nanomechanical properties and outstanding ferromagnetism. Synthesis and characterization of structural, magnetic and nanomechanical properties of Ni-doped AlN films deposited by magnetron sputtering are reported. The films exhibited ferromagnetism with a Curie temperature above 400K. The observed room temperature saturation magnetization tended to decrease with increasing Ni concentration, which has the maximum 4.56emu/cm3. The nanomechanical analysis testified that the degradation of crystalline quality in the films with high Ni content results in the decreasing hardness, Young’s modulus and slight decrease of friction coefficient. Al1−xNixN films for x=0.021 exhibited favorable nanomechanical properties and outstanding ferromagnetism which confirm the possible application in spin electronics.