Gold ion implantation induced high conductivity and enhanced electron field emission properties in ultrananocrystalline diamond films

We report high conductivity of 185 (Ω cm)−1 and superior electron field emission (EFE) properties, viz. low turn-on field of 4.88 V/μm with high EFE current density of 6.52 mA/cm2 at an applied field of 8.0 V/μm in ultrananocrystalline diamond (UNCD) films due to gold ion implantation. Transmission...

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Veröffentlicht in:Applied physics letters 2013-02, Vol.102 (6)
Hauptverfasser: Sankaran, K. J., Chen, H. C., Sundaravel, B., Lee, C. Y., Tai, N. H., Lin, I. N.
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Sprache:eng
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Zusammenfassung:We report high conductivity of 185 (Ω cm)−1 and superior electron field emission (EFE) properties, viz. low turn-on field of 4.88 V/μm with high EFE current density of 6.52 mA/cm2 at an applied field of 8.0 V/μm in ultrananocrystalline diamond (UNCD) films due to gold ion implantation. Transmission electron microscopy examinations reveal the presence of Au nanoparticles in films, which result in the induction of nanographitic phases in grain boundaries, forming conduction channels for electron transport. Highly conducting Au ion implanted UNCD films overwhelms that of nitrogen doped ones and will create a remarkable impact to diamond-based electronics.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4792744