Self-Assembly: Sacrificial-Post Templating Method for Block Copolymer Self-Assembly (Small 3/2014)

Self-Assembly: Sacrificial-Post Templating Method for Block Copolymer Self-Assembly (Small 3/2014)

Block copolymer (BCP) thin films self‐assemble to form nanoscale patterns, as K. K. Berggren and co‐workers report on page 493. On a smooth substrate, the polystyrene‐block‐poly(dimethylsiloxane) copolymer forms randomly oriented inplane cylinders with a 35‐nm period (images on the left). A set of s...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2014-02, Vol.10 (3), p.418-418
Hauptverfasser: Tavakkoli K. G., Amir, Nicaise, Samuel M., Hannon, Adam F., Gotrik, Kevin W., Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K.
Format: Artikel
Sprache:eng
Schlagworte:
Arrays
block copolymer
Block copolymers
Copolymers
Nanostructure
nanostructures
Nanotechnology
Polymethyl methacrylates
Polystyrene resins
sacrificial-post template
Self assembly
square lattices
Thin films
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Zusammenfassung:Block copolymer (BCP) thin films self‐assemble to form nanoscale patterns, as K. K. Berggren and co‐workers report on page 493. On a smooth substrate, the polystyrene‐block‐poly(dimethylsiloxane) copolymer forms randomly oriented inplane cylinders with a 35‐nm period (images on the left). A set of sacrifical nanoposts made of poly(methyl methacrylate) directed the self‐assembly to form (center top to bottom): square arrays of spheres or holes, and square and hexagonal meshes with bimodal hole‐size distributions. The posts and the polystyrene are removed by etching and the final pattern consists of oxidized poly(dimethylsiloxane)
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.201470017