Stitching-error reduction in gratings by shot-shifted electron-beam lithography

Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in s...

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Veröffentlicht in:	Journal of lightwave technology 2001-10, Vol.19 (10), p.1527-1531
Hauptverfasser:	Dougherty, D.J., Muller, R.E., Maker, P.D., Forouhar, S.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Circuit properties Diffraction gratings Distributed feedback devices Electric, optical and optoelectronic circuits Electron beam lithography Electronics Exact sciences and technology Filtering Filtration Gratings Gratings (spectra) Integrated optics. Optical fibers and wave guides Laboratories Laser feedback Laser modes Lithography Mathematical analysis Miscellaneous Optical and optoelectronic circuits Optical feedback Optical filters Reduction Semiconductor lasers Separation Writing
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Beschreibung
Zusammenfassung:	Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in stitching-error side modes.
ISSN:	0733-8724 1558-2213
DOI:	10.1109/50.956140