Influence of sputtering pressure on the structure and ionic conductivity of thin film amorphous electrolyte

Ionic conducting thin film amorphous electrolytes are promising candidates for microelectronics applications. This study presents an investigation into the structure and composition of lithium phosphorus oxynitride (LiPON) thin film electrolyte prepared using radio frequency (RF) sputtering on Li 3...

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Veröffentlicht in:	Journal of materials science 2011-12, Vol.46 (23), p.7588-7593
Hauptverfasser:	Hu, Zongqian, Xie, Kai, Wei, Di, Ullah, Najeeb
Format:	Artikel
Sprache:	eng
Schlagworte:	Characterization and Evaluation of Materials Chemistry and Materials Science Classical Mechanics Composition Crosslinking Crystallography and Scattering Methods Density Deposition Dielectric films Electric properties Electrolytes Ion currents Ionic conductivity Ions Lithium Low pressure Materials Science Photoelectrons Polymer Sciences Radio frequencies Radio frequency Solid Mechanics Sputtering Tetrahedra Thin films X ray photoelectron spectroscopy
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Zusammenfassung:	Ionic conducting thin film amorphous electrolytes are promising candidates for microelectronics applications. This study presents an investigation into the structure and composition of lithium phosphorus oxynitride (LiPON) thin film electrolyte prepared using radio frequency (RF) sputtering on Li 3 PO 4 target. The ionic conductivity of LiPON thin films has been dramatically improved by decreasing N 2 pressure. X-ray photoelectron spectra (XPS) were used to determine the structure and composition of LiPON thin films. It was found that increasing the N 2 pressure during the deposition process resulted in a greatly decreased formation of triply coordinated –N
ISSN:	0022-2461 1573-4803
DOI:	10.1007/s10853-011-5734-y