UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer
We reported the replication of sub-100 nm nanostructures by an ultraviolet (UV) nanoimprint lithography (NIL) technique. We used a novel UV curable epoxy siloxane polymer as the NIL resist to achieve features as small as 50 nm. The polymeric soft molds for the NIL were fabricated by casting toluene...
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| Veröffentlicht in: | Microelectronic engineering 2010-11, Vol.87 (11), p.2411-2415 |
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| container_title | Microelectronic engineering |
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| creator | Ye, Dexian Wang, Pei-I Ye, Zhuqiu Ou, Ya Ghoshal, Rajat Ghoshal, Ramkrishna Lu, Toh-Ming |
| description | We reported the replication of sub-100
nm nanostructures by an ultraviolet (UV) nanoimprint lithography (NIL) technique. We used a novel UV curable epoxy siloxane polymer as the NIL resist to achieve features as small as 50
nm. The polymeric soft molds for the NIL were fabricated by casting toluene diluted poly(dimethyl-siloxane) (PDMS) on the hydrogensilsesquioxane (HSQ) hard mold. The NIL results were characterized by using a scanning electron microscope and an atomic force microscope. Our results illustrate that, with the epoxy siloxane resist, the 50
nm HSQ features on the hard mold can be successfully replicated using PDMS soft molds. |
| doi_str_mv | 10.1016/j.mee.2010.04.016 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1671420737</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0167931710001413</els_id><sourcerecordid>1671420737</sourcerecordid><originalsourceid>FETCH-LOGICAL-c360t-bcbc2736f5b663094d0c00f9410f84e4c65deda86acd1e47158d1ebc5054c64d3</originalsourceid><addsrcrecordid>eNp9kE1PxCAQhonRxPXjB3jjYuKl67BA240nY_xKTLyoV0LpdGVDoUJr3H8v6xqPnibzzjMvzEvIGYM5A1Zeruc94nwBuQcxz8oembG64oWUZb1PZlmpiiVn1SE5SmkNuRdQz8jq9Y167YPth2j9SJ0d38Mq6uF9Q0NH09QUDID6_odKY5zMOEVMdErWr6imPnyio9nFTFE3DikO4WtDk3XhS3ukQ3CbHuMJOei0S3j6W4_J693ty81D8fR8_3hz_VQYXsJYNKYxi4qXnWzKksNStGAAuqVg0NUChSlli62uS21ahqJiss61MRJknomWH5OLne8Qw8eEaVS9TQady38JU1I5BiYWUPEqo2yHmhhSitipHEGv40YxUNtQ1VrlUNU2VAVCZSXvnP_a62S066L2xqa_xQVnkkvYclc7DvOtnxajSsaiN9jaiGZUbbD_vPIN0nKNRQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1671420737</pqid></control><display><type>article</type><title>UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer</title><source>Elsevier ScienceDirect Journals</source><creator>Ye, Dexian ; Wang, Pei-I ; Ye, Zhuqiu ; Ou, Ya ; Ghoshal, Rajat ; Ghoshal, Ramkrishna ; Lu, Toh-Ming</creator><creatorcontrib>Ye, Dexian ; Wang, Pei-I ; Ye, Zhuqiu ; Ou, Ya ; Ghoshal, Rajat ; Ghoshal, Ramkrishna ; Lu, Toh-Ming</creatorcontrib><description>We reported the replication of sub-100
nm nanostructures by an ultraviolet (UV) nanoimprint lithography (NIL) technique. We used a novel UV curable epoxy siloxane polymer as the NIL resist to achieve features as small as 50
nm. The polymeric soft molds for the NIL were fabricated by casting toluene diluted poly(dimethyl-siloxane) (PDMS) on the hydrogensilsesquioxane (HSQ) hard mold. The NIL results were characterized by using a scanning electron microscope and an atomic force microscope. Our results illustrate that, with the epoxy siloxane resist, the 50
nm HSQ features on the hard mold can be successfully replicated using PDMS soft molds.</description><identifier>ISSN: 0167-9317</identifier><identifier>EISSN: 1873-5568</identifier><identifier>DOI: 10.1016/j.mee.2010.04.016</identifier><identifier>CODEN: MIENEF</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Electronics ; Epoxy siloxane polymers ; Exact sciences and technology ; Lithography ; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties ; Materials science ; Methods of nanofabrication ; Microelectronic fabrication (materials and surfaces technology) ; Molds ; Nanocomposites ; Nanoimprint resist ; Nanolithography ; Nanomaterials ; Nanoscale pattern formation ; Nanostructure ; Physics ; Scanning electron microscopy ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Silicone resins ; Siloxanes ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; UV curable polymers ; UV nanoimprint lithography</subject><ispartof>Microelectronic engineering, 2010-11, Vol.87 (11), p.2411-2415</ispartof><rights>2010 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c360t-bcbc2736f5b663094d0c00f9410f84e4c65deda86acd1e47158d1ebc5054c64d3</citedby><cites>FETCH-LOGICAL-c360t-bcbc2736f5b663094d0c00f9410f84e4c65deda86acd1e47158d1ebc5054c64d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0167931710001413$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=23153506$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Ye, Dexian</creatorcontrib><creatorcontrib>Wang, Pei-I</creatorcontrib><creatorcontrib>Ye, Zhuqiu</creatorcontrib><creatorcontrib>Ou, Ya</creatorcontrib><creatorcontrib>Ghoshal, Rajat</creatorcontrib><creatorcontrib>Ghoshal, Ramkrishna</creatorcontrib><creatorcontrib>Lu, Toh-Ming</creatorcontrib><title>UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer</title><title>Microelectronic engineering</title><description>We reported the replication of sub-100
nm nanostructures by an ultraviolet (UV) nanoimprint lithography (NIL) technique. We used a novel UV curable epoxy siloxane polymer as the NIL resist to achieve features as small as 50
nm. The polymeric soft molds for the NIL were fabricated by casting toluene diluted poly(dimethyl-siloxane) (PDMS) on the hydrogensilsesquioxane (HSQ) hard mold. The NIL results were characterized by using a scanning electron microscope and an atomic force microscope. Our results illustrate that, with the epoxy siloxane resist, the 50
nm HSQ features on the hard mold can be successfully replicated using PDMS soft molds.</description><subject>Applied sciences</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronics</subject><subject>Epoxy siloxane polymers</subject><subject>Exact sciences and technology</subject><subject>Lithography</subject><subject>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</subject><subject>Materials science</subject><subject>Methods of nanofabrication</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Molds</subject><subject>Nanocomposites</subject><subject>Nanoimprint resist</subject><subject>Nanolithography</subject><subject>Nanomaterials</subject><subject>Nanoscale pattern formation</subject><subject>Nanostructure</subject><subject>Physics</subject><subject>Scanning electron microscopy</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Silicone resins</subject><subject>Siloxanes</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>UV curable polymers</subject><subject>UV nanoimprint lithography</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kE1PxCAQhonRxPXjB3jjYuKl67BA240nY_xKTLyoV0LpdGVDoUJr3H8v6xqPnibzzjMvzEvIGYM5A1Zeruc94nwBuQcxz8oembG64oWUZb1PZlmpiiVn1SE5SmkNuRdQz8jq9Y167YPth2j9SJ0d38Mq6uF9Q0NH09QUDID6_odKY5zMOEVMdErWr6imPnyio9nFTFE3DikO4WtDk3XhS3ukQ3CbHuMJOei0S3j6W4_J693ty81D8fR8_3hz_VQYXsJYNKYxi4qXnWzKksNStGAAuqVg0NUChSlli62uS21ahqJiss61MRJknomWH5OLne8Qw8eEaVS9TQady38JU1I5BiYWUPEqo2yHmhhSitipHEGv40YxUNtQ1VrlUNU2VAVCZSXvnP_a62S066L2xqa_xQVnkkvYclc7DvOtnxajSsaiN9jaiGZUbbD_vPIN0nKNRQ</recordid><startdate>20101101</startdate><enddate>20101101</enddate><creator>Ye, Dexian</creator><creator>Wang, Pei-I</creator><creator>Ye, Zhuqiu</creator><creator>Ou, Ya</creator><creator>Ghoshal, Rajat</creator><creator>Ghoshal, Ramkrishna</creator><creator>Lu, Toh-Ming</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20101101</creationdate><title>UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer</title><author>Ye, Dexian ; Wang, Pei-I ; Ye, Zhuqiu ; Ou, Ya ; Ghoshal, Rajat ; Ghoshal, Ramkrishna ; Lu, Toh-Ming</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c360t-bcbc2736f5b663094d0c00f9410f84e4c65deda86acd1e47158d1ebc5054c64d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Applied sciences</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronics</topic><topic>Epoxy siloxane polymers</topic><topic>Exact sciences and technology</topic><topic>Lithography</topic><topic>Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties</topic><topic>Materials science</topic><topic>Methods of nanofabrication</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Molds</topic><topic>Nanocomposites</topic><topic>Nanoimprint resist</topic><topic>Nanolithography</topic><topic>Nanomaterials</topic><topic>Nanoscale pattern formation</topic><topic>Nanostructure</topic><topic>Physics</topic><topic>Scanning electron microscopy</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Silicone resins</topic><topic>Siloxanes</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>UV curable polymers</topic><topic>UV nanoimprint lithography</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ye, Dexian</creatorcontrib><creatorcontrib>Wang, Pei-I</creatorcontrib><creatorcontrib>Ye, Zhuqiu</creatorcontrib><creatorcontrib>Ou, Ya</creatorcontrib><creatorcontrib>Ghoshal, Rajat</creatorcontrib><creatorcontrib>Ghoshal, Ramkrishna</creatorcontrib><creatorcontrib>Lu, Toh-Ming</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ye, Dexian</au><au>Wang, Pei-I</au><au>Ye, Zhuqiu</au><au>Ou, Ya</au><au>Ghoshal, Rajat</au><au>Ghoshal, Ramkrishna</au><au>Lu, Toh-Ming</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer</atitle><jtitle>Microelectronic engineering</jtitle><date>2010-11-01</date><risdate>2010</risdate><volume>87</volume><issue>11</issue><spage>2411</spage><epage>2415</epage><pages>2411-2415</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><coden>MIENEF</coden><abstract>We reported the replication of sub-100
nm nanostructures by an ultraviolet (UV) nanoimprint lithography (NIL) technique. We used a novel UV curable epoxy siloxane polymer as the NIL resist to achieve features as small as 50
nm. The polymeric soft molds for the NIL were fabricated by casting toluene diluted poly(dimethyl-siloxane) (PDMS) on the hydrogensilsesquioxane (HSQ) hard mold. The NIL results were characterized by using a scanning electron microscope and an atomic force microscope. Our results illustrate that, with the epoxy siloxane resist, the 50
nm HSQ features on the hard mold can be successfully replicated using PDMS soft molds.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2010.04.016</doi><tpages>5</tpages></addata></record> |
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| identifier | ISSN: 0167-9317 |
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| subjects | Applied sciences Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Electronics Epoxy siloxane polymers Exact sciences and technology Lithography Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Methods of nanofabrication Microelectronic fabrication (materials and surfaces technology) Molds Nanocomposites Nanoimprint resist Nanolithography Nanomaterials Nanoscale pattern formation Nanostructure Physics Scanning electron microscopy Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Silicone resins Siloxanes Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) UV curable polymers UV nanoimprint lithography |
| title | UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-11T02%3A26%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=UV%20nanoimprint%20lithography%20of%20sub-100%20nm%20nanostructures%20using%20a%20novel%20UV%20curable%20epoxy%20siloxane%20polymer&rft.jtitle=Microelectronic%20engineering&rft.au=Ye,%20Dexian&rft.date=2010-11-01&rft.volume=87&rft.issue=11&rft.spage=2411&rft.epage=2415&rft.pages=2411-2415&rft.issn=0167-9317&rft.eissn=1873-5568&rft.coden=MIENEF&rft_id=info:doi/10.1016/j.mee.2010.04.016&rft_dat=%3Cproquest_cross%3E1671420737%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1671420737&rft_id=info:pmid/&rft_els_id=S0167931710001413&rfr_iscdi=true |