Composition and properties of TiN(x) thin films prepared by DC magnetron sputtering

TiN(x) thin films were deposited on p-Si(111) substrate by DC magnetron reactive sputtering method. The composition, structure and photoelectric properties of the films were studied by using energy dispersive x-ray spectroscopy (EDX), x-ray diffraction (XRD), UV-visible spectrophotometer, and four-p...

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Veröffentlicht in:	Hong wai yu hao mi bo xue bao 2010-07, Vol.29 (4), p.245-247
Hauptverfasser:	Li, Hai-Yi, Lai, Zhen-Quan, Zhu, Xiu-Rong, Hu, Min
Format:	Artikel
Sprache:	chi
Schlagworte:	Direct current Electrical resistivity Infrared Magnetron sputtering Meters Millimeter waves Photoelectric effect Preferred orientation Thin films
Online-Zugang:	Volltext
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