Imprinting the nanostructures on the high refractive index semiconductor glass

► High aspect ratio nano-replication onto the surface of glass and of semiconductor. ► Nanoimprinting less than 100 nm pitch structures on the surface of glass and of semiconductor. ► Nano-replicated high refractive index semiconductor glass for application in photonic crystals, sub-microelectronic chips and moth eye structures. The centimeter range one- and two-dimensional nanostructures of 70 nm pitch have been imprinted by hot pressing with a quartz, silicon or nickel mold, at 240 °C, onto the surface of Ge 20As 20Se 14Te 46 semiconductor glass. Excellent glass stability of this glass allows multiple re-pressing of the nano-structures. With increasing the Te/Se ratio in the glass formula, the refractive index reaches a value of 3.5 with an option of free electron absorption at elevated temperatures pointing out the use of such nanostructures in submicron and micron scale electronic devices/chips, moth eye structures and photonic crystals.