Micro-stitching interferometry at the ESRF

Micro-stitching interferometry at the ESRF

The ESRF metrology laboratory has recently acquired a new optical micro-interferometer optimised for micro-roughness measurement of X-ray mirrors. The fully integrated system offers a wide range of measurement capabilities adapted for both very rough surfaces and super smooth surfaces (

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Bibliographische Detailangaben
Veröffentlicht in:Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment Accelerators, spectrometers, detectors and associated equipment, 2010-05, Vol.616 (2), p.183-187
Hauptverfasser: Rommeveaux, Amparo, Barrett, Raymond
Format: Artikel
Sprache:eng
Schlagworte:
Accelerators
Flexibility
Handles
Interferometry
Long trace profiler
Metrology
Micro-stitching interferometry
Repeatability
Reproducibility
Stitching
X-ray mirror
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Beschreibung
Zusammenfassung:The ESRF metrology laboratory has recently acquired a new optical micro-interferometer optimised for micro-roughness measurement of X-ray mirrors. The fully integrated system offers a wide range of measurement capabilities adapted for both very rough surfaces and super smooth surfaces (
ISSN:0168-9002
1872-9576
DOI:10.1016/j.nima.2009.11.020