Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4/Ar mixture

Hydrogenated amorphous carbon (a-C:H) films were deposited on steel and silicon wafers by unbalanced magnetron sputtering under different CH4/Ar ratios. Microstructure and properties of the a-C:H films were investigated via Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Atomic f...

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Veröffentlicht in:	Surface & coatings technology 2011-06, Vol.205 (19), p.4577-4581
Hauptverfasser:	Wang, Yongxia, Ye, Yinping, Li, Hongxuan, Ji, Li, Wang, Yongjun, Liu, Xiaohong, Chen, Jianmin, Zhou, Huidi
Format:	Artikel
Sprache:	eng
Schlagworte:	a-C:H film Applied sciences Atomic force microscopy Cross-disciplinary physics: materials science rheology Curvature Deposition Exact sciences and technology Fourier transforms Infrared spectroscopy Magnetron sputtering Materials science Metals. Metallurgy Microstructure Physics Production techniques Surface treatment Surface treatments Tribological property Tribology
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Beschreibung
Zusammenfassung:	Hydrogenated amorphous carbon (a-C:H) films were deposited on steel and silicon wafers by unbalanced magnetron sputtering under different CH4/Ar ratios. Microstructure and properties of the a-C:H films were investigated via Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, Atomic force microscopy (AFM) and substrate curvature method. The results revealed that CH4/Ar ratio played an important role in the H content but acted a little function on the sp3/sp2 ratio of the films. Also, the internal stress of those films was relatively low (
ISSN:	0257-8972 1879-3347
DOI:	10.1016/j.surfcoat.2011.03.120