Fabrication of low-loss optical-quality polymer waveguide facets in multilayer polymer devices using an inductively coupled plasma

A systematic study of the etching of multilayer polymer stacks using an inductively coupled plasma (ICP) has been performed. The optimized parameters were used to etch smooth vertical features in a three-layer polymer device, which are suitable for use as low-loss waveguide facets. Waveguide facets...

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Veröffentlicht in:Journal of lightwave technology 2005-04, Vol.23 (4), p.1787-1790
Hauptverfasser: Diffey, W.M., Trimm, R.H., Temmen, M.G., Ashley, P.R.
Format: Artikel
Sprache:eng
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Zusammenfassung:A systematic study of the etching of multilayer polymer stacks using an inductively coupled plasma (ICP) has been performed. The optimized parameters were used to etch smooth vertical features in a three-layer polymer device, which are suitable for use as low-loss waveguide facets. Waveguide facets of sufficient optical quality to allow the direct coupling of the output from an actively aligned super luminescent diode (SLD) with a coupling efficiency of 40% have been demonstrated. The ability to fabricate optical-quality waveguide facets through a dry etching process, rather than mechanical means such as dicing, can enable the production of compact highly integrated optical devices.
ISSN:0733-8724
1558-2213
DOI:10.1109/JLT.2005.843839