Fabrication of low-loss optical-quality polymer waveguide facets in multilayer polymer devices using an inductively coupled plasma
A systematic study of the etching of multilayer polymer stacks using an inductively coupled plasma (ICP) has been performed. The optimized parameters were used to etch smooth vertical features in a three-layer polymer device, which are suitable for use as low-loss waveguide facets. Waveguide facets...
Gespeichert in:
Veröffentlicht in: | Journal of lightwave technology 2005-04, Vol.23 (4), p.1787-1790 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A systematic study of the etching of multilayer polymer stacks using an inductively coupled plasma (ICP) has been performed. The optimized parameters were used to etch smooth vertical features in a three-layer polymer device, which are suitable for use as low-loss waveguide facets. Waveguide facets of sufficient optical quality to allow the direct coupling of the output from an actively aligned super luminescent diode (SLD) with a coupling efficiency of 40% have been demonstrated. The ability to fabricate optical-quality waveguide facets through a dry etching process, rather than mechanical means such as dicing, can enable the production of compact highly integrated optical devices. |
---|---|
ISSN: | 0733-8724 1558-2213 |
DOI: | 10.1109/JLT.2005.843839 |