Valence-band offset of p-NiO/n-ZnO heterojunction measured by X-ray photoelectron spectroscopy

X-ray photoelectron spectroscopy was used to measure the valence-band offset (VBO) of the NiO/ZnO heterojunction grown on quartz substrate by radio frequency (RF) magnetron sputtering. Core levels of Ni 2p and Zn 2p were used to align the VBO of p-NiO/n-ZnO heterojunction. The valence-band offset (Δ...

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Veröffentlicht in:Physics letters. A 2011-04, Vol.375 (16), p.1760-1763
Hauptverfasser: Yang, Zhi-Guo, Zhu, Li-Ping, Guo, Yan-Min, Tian, Wei, Ye, Zhi-Zhen, Zhao, Bing-Hui
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Sprache:eng
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Zusammenfassung:X-ray photoelectron spectroscopy was used to measure the valence-band offset (VBO) of the NiO/ZnO heterojunction grown on quartz substrate by radio frequency (RF) magnetron sputtering. Core levels of Ni 2p and Zn 2p were used to align the VBO of p-NiO/n-ZnO heterojunction. The valence-band offset (ΔEV) is determined to be 1.47 eV. According to the band gap of 3.7 eV for NiO and 3.37 eV for ZnO, the conduction-band offset (ΔEC) in the structure was calculated to be 1.8 eV, and it has a type-II band alignment. ► We measured the ΔEV of NiO/ZnO heterojunction which use NiO as the epitaxial layer. ► The NiO/ZnO heterojunction has a type-II band alignment with ΔEV of 1.47 eV. ► The ΔEV of NiO/ZnO at different growth sequence of ZnO and NiO layers are different.
ISSN:0375-9601
1873-2429
DOI:10.1016/j.physleta.2011.03.021