Synthesis and characterization of SnO2 nanoparticles embedded in silica by ion implantation

Tin dioxide nanoparticles embedded in silica matrix were fabricated by ion implantation combined with thermal oxidation. Silica substrate was implanted with a 150keV Sn+ ions beam with a fluence of 1.0A-1017 ions/cm2. The sample was annealed for 1h in a conventional furnace at a temperature of 800A...

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Veröffentlicht in:	Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Beam interactions with materials and atoms, 2010-10, Vol.268 (19), p.3063-3065
Hauptverfasser:	Tagliente, M.A., Bello, V., Pellegrini, G., Mattei, G., Mazzoldi, P., Massaro, M., Carbone, D.
Format:	Artikel
Sprache:	eng
Schlagworte:	Annealing Ion implantation Nanoparticles Oxidation Silicon dioxide Tin Tin dioxide Tin oxides
Online-Zugang:	Volltext
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