Measure the barrier height of manganite p–n heterojunction by activation energy measurement
The barrier height of the manganite based p–n heterojunction is identified from the activation energy. The La0.35Pr0.32Ca0.33MnO3/Nb-doped SrTiO3 p–n heterojunction is fabricated by the pulse laser deposition technology. The junction shows good rectifying behavior which can be well described by the...
Gespeichert in:
Veröffentlicht in: | Materials science in semiconductor processing 2015-01, Vol.29, p.213-217 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The barrier height of the manganite based p–n heterojunction is identified from the activation energy. The La0.35Pr0.32Ca0.33MnO3/Nb-doped SrTiO3 p–n heterojunction is fabricated by the pulse laser deposition technology. The junction shows good rectifying behavior which can be well described by the Shockley equation. A satisfactorily logarithmic linear dependence of resistance on temperature is observed, and also the relation between bias and activation energy (EA) deduced from the R−1/T curves is linear. As a result, the interfacial barrier of the heterojunction is obtained by extrapolating the Bias –EA plot to Y axis, which is 0.95eV. |
---|---|
ISSN: | 1369-8001 1873-4081 |
DOI: | 10.1016/j.mssp.2014.03.014 |