Tunnel current and I–V characteristics of vacuum extremely-high-frequency microelectronic structures

Tunneling (cold emission) through potential barriers of a complex shape in vacuum microelectronic diode and triode structures, including those with several electrodes, is theoretically investigated and I – V characteristics of these structures are obtained.

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Veröffentlicht in:Journal of communications technology & electronics 2015-02, Vol.60 (2), p.193-203
1. Verfasser: Bushuev, N. A.
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description Tunneling (cold emission) through potential barriers of a complex shape in vacuum microelectronic diode and triode structures, including those with several electrodes, is theoretically investigated and I – V characteristics of these structures are obtained.
doi_str_mv 10.1134/S1064226915020023
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subjects Analysis
Communications Engineering
Communications technology
Diodes
Electrodes
Electron and Ion Emission
Electrons
Emission
Emission analysis
Energy
Engineering
Microelectronics
Networks
Potential barriers
Studies
Triodes
Tunnels (transportation)
Vacuum technology
title Tunnel current and I–V characteristics of vacuum extremely-high-frequency microelectronic structures
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