Improved MOSFET characterization technique for single channel length, scaled transistors

•Proposes correction to standard linear charge model to improve fitting at low Vgt.•Allows mobility, threshold voltage and Rsd extraction.•Applicable to scaled, single Lg transistors. The MOSFET characterization technique proposed here permits parameter extraction from ultra-short channel single len...

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Veröffentlicht in:Solid-state electronics 2015-02, Vol.104, p.44-46
Hauptverfasser: Ferdousi, Fahmida, Rios, Rafael, Kuhn, Kelin J.
Format: Artikel
Sprache:eng
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Zusammenfassung:•Proposes correction to standard linear charge model to improve fitting at low Vgt.•Allows mobility, threshold voltage and Rsd extraction.•Applicable to scaled, single Lg transistors. The MOSFET characterization technique proposed here permits parameter extraction from ultra-short channel single length devices. The technique is based on an improved charge correction which allows extension of the gate overdrive to lower range and leads to better accuracy of extracted quantities such as effective mobility, threshold voltage, and effective parasitic resistance. The method is applicable to both planar and non-planar technologies at highly scaled gate lengths.
ISSN:0038-1101
1879-2405
DOI:10.1016/j.sse.2014.10.010