Precise control of chemical vapor deposition graphene layer thickness using Ni sub(x)Cu sub(1-x) alloys
We investigated a simple but effective method to precisely control the desired number of graphene layers on the Ni sub(x)Cu sub(1-x) alloy substrates by thermal chemical vapor deposition. Our method could be utilized to precisely control the number of graphene layers without altering growth conditio...
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| Veröffentlicht in: | Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2015-02, Vol.3 (7), p.1463-1467 |
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| container_end_page | 1467 |
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| container_issue | 7 |
| container_start_page | 1463 |
| container_title | Journal of materials chemistry. C, Materials for optical and electronic devices |
| container_volume | 3 |
| creator | Choi, Hyonkwang Lim, Yeongjin Park, Minjeong Lee, Sehui Kang, Younsik Kim, Min Su Kim, Jeongyong Jeon, Minhyon |
| description | We investigated a simple but effective method to precisely control the desired number of graphene layers on the Ni sub(x)Cu sub(1-x) alloy substrates by thermal chemical vapor deposition. Our method could be utilized to precisely control the number of graphene layers without altering growth conditions such as growth temperature and the cooling rate. |
| doi_str_mv | 10.1039/c4tc01979b |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 2050-7526 |
| ispartof | Journal of materials chemistry. C, Materials for optical and electronic devices, 2015-02, Vol.3 (7), p.1463-1467 |
| issn | 2050-7526 2050-7534 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_1669869114 |
| source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
| subjects | Alloys CHEMICAL VAPOR DEPOSITION Cooling rate DEPOSITION Electronic devices ELECTRONIC PRODUCTS Graphene MICA VAPOR DEPOSITION |
| title | Precise control of chemical vapor deposition graphene layer thickness using Ni sub(x)Cu sub(1-x) alloys |
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