8.2: Invited Paper: Status and Future Promise of Excimer Laser Annealing for LTPS on Large Glass Substrates

8.2: Invited Paper: Status and Future Promise of Excimer Laser Annealing for LTPS on Large Glass Substrates

Low‐Temperature Polycrystalline Silicon (LTPS) is the enabling backplane technology for AMOLED displays and small to medium sized high‐resolution AMLCDs. Recently, Excimer Laser Annealing (ELA) equipment has made significant progress in scaling for cost‐effective large‐scale production. In this pape...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:SID International Symposium Digest of technical papers 2014-06, Vol.45 (1), p.79-82
Hauptverfasser: Sobey, Mark, Schmidt, Kai, Turk, Brandon, Paetzel, Rainer
Format: Artikel
Sprache:eng
Schlagworte:
Active matrix displays
Annealing
crystallization
Displays
ELA
Equipment costs
excimer laser
excimer laser annealing
Excimer lasers
Glass substrates
Lasers
line beam
low-temperature polycrystalline silicon
LTPS
Organic light emitting diodes
Silicon
Technical papers
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Low‐Temperature Polycrystalline Silicon (LTPS) is the enabling backplane technology for AMOLED displays and small to medium sized high‐resolution AMLCDs. Recently, Excimer Laser Annealing (ELA) equipment has made significant progress in scaling for cost‐effective large‐scale production. In this paper, we discuss the key elements of ELA equipment and the recent and future milestones for LTPS on large substrates.
ISSN:0097-966X
2168-0159
DOI:10.1002/j.2168-0159.2014.tb00022.x