P-113: Photoalignment Technology for High Performance IPS-LCDs: IPS-NEO Technology

We have developed our original photoalignment technology, IPS‐NEO, which improves azimuthal anchoring strength to a level equivalent to that of rubbing, and reduces photoirradiation energy to a level required for mass production. We have also clarified that the anchoring strength of IPS‐NEO does not depend on the unevenness of the surface of the substrates, nor does it depend on the bias angle between the alignment axis and the direction of the electrodes. With this technology, we realized practical application of photoalignment for high performance IPS‐LCDs.