4.3: Novel Photosensitive Organic Insulator for High Definition FPD Applications

4.3: Novel Photosensitive Organic Insulator for High Definition FPD Applications

We have developed a novel photosensitive organic insulator for high definition FPD applications. This material has excellent features: ultrahigh sensitivity, fine patterns formation, excellent transparency and out‐gas properties. Meanwhile, a photosensitive organic insulator prepared by nano‐composi...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2014-06, Vol.45 (1), p.24-27
Hauptverfasser: Nakamura, Hideyuki, Kashiwagi, Daisuke, Yamada, Satoru, Sakita, Kyouhei, Kawabe, Yasumasa
Format: Artikel
Sprache:eng
Schlagworte:
chemical amplification
Electrodes
Flat panel displays
Formations
High definition
high luminescence
high refractive index
high sensitivity
Insulators
light extraction efficiency
low dielectric constant
low out-gas
low power consumption
low water permeability
Nanostructure
narrow bezel
organic insulating material
organic passivation
Photosensitivity
positive tone
Technical papers
through-hole
visibility
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Beschreibung
Zusammenfassung:We have developed a novel photosensitive organic insulator for high definition FPD applications. This material has excellent features: ultrahigh sensitivity, fine patterns formation, excellent transparency and out‐gas properties. Meanwhile, a photosensitive organic insulator prepared by nano‐composite formation is able to be utilized for improving the visibility of ITO electrode patterns for a touch panel application and patterns of the insulator itself completely.
ISSN:0097-966X
2168-0159
DOI:10.1002/j.2168-0159.2014.tb00007.x