NIST high throughput variable kinetic energy hard X-ray photoelectron spectroscopy facility

•High throughput HAPXES beamline provides beam energies between 2.1 and 6keV.•Recent results in depth profiling of materials for next-generation CMOS.•Facility ideal or measurement of energy level alignment at buried interfaces.•Approved beamline NSLS II will provide wider energy range and X-ray flux. We present an overview of the National Institute of Standards and Technology beamline X24A at the National Synchrotron Light Source at Brookhaven National Lab and recent work performed at the facility. The beamline is equipped for HAXPES measurements, with an energy range from 2.1 to 6keV with Si(111) crystals. Recent measurements performed at the beamline include non-destructive depth dependent variable kinetic energy measurements of dielectric and semiconductor films and interfaces for microelectronics applications, band alignment at buried interfaces, and the electronic structure of bulk-like materials. The design and operation of the current beamline will be discussed, as well as the future NIST beamline at NSLS II.