Studies of giant magnetoresistive Co—Cu multilayers

In the first part of this paper we describe how we are using UHV DC magnetron sputtering to deposit giant magnetoresistive Co—Cu multilayers. In the second section we describe factors which are likely to affect the variation of magnetoresistance with temperature. In the third part we explain how antiphase domain boundaries can reduce the perfection of antiferromagnetic alignment obtained in Co—Cu multilayers in zero applied field, and describe possible features of such boundaries.