Low threshold current density 1.3 mu m metamorphic InGaAs/GaAs quantum well laser diodes

Very low threshold current density InGaAs/GaAs quantum well laser diodes grown by molecular beam epitaxy on InGaAs metamorphic buffers are reported. The lasing wavelength of the ridge waveguide laser diode with cavity length of 1,200 mu m is centred at 1337.2 nm; the threshold current density is 205...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Electronics letters 2008-03, Vol.44 (7), p.1-1
Hauptverfasser: Wu, D, Wang, H, Wu, B, Ni, H, Huang, S, Xiong, Y, Wang, P, Han, Q, Niu, Z, Tangring, I, Wang, S M
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Very low threshold current density InGaAs/GaAs quantum well laser diodes grown by molecular beam epitaxy on InGaAs metamorphic buffers are reported. The lasing wavelength of the ridge waveguide laser diode with cavity length of 1,200 mu m is centred at 1337.2 nm; the threshold current density is 205 A/cm2 at room temperature under continuous-wave operation.
ISSN:0013-5194
1350-911X